The KLA-Tencor INM300 DUV microscope includes the latest enhancements in optical imaging capabilities offering the flexibility to include 248nm DUV, 365nm UV, visual brightfield, darkfield and DIC illumination modes.
With resolution capabilities down to 80nm, advanced automation and a stage travel of 300 x 300mm, this high-performance benchtop optical microscope can be used for critical materials, coating and process defect review for wafers, masks, optoelectronics and hard disk applications.

The opportunity to use various imaging modes to best suit the optical properties of the materials offers a superior advantage in being able to visualize, detect and analyze the greatest variation of process defects.

• Superb HCS visual, UV and DUV optics provide crisp and high contrast images with highest resolution
• Real-time autofocus with upper end-switch for sample protection
• Imaging modes from brightfield, darkfield, DIC, 365nm UV and 248nm DUV with automated controls
• 150x/0.90 UV (365nm) objective with 130nm resolution
• Cement-free 150x/0.90 DUV (248nm) objective with 80nm resolution
• Long Working Distance L50x DUV cement-free objective for thorough pellicle inspection of masks
• Cement-free 200x/1.25 DUV water immersion objective with 60nm resolution
• Upper limit focus stop and programmable nosepiece for safety and ease of use
• Modular system configurations for all wafer sizes with manual or scanning stages
• User-friendly VISCON software packages for semi-automated inspection and review

Contact our authorized sales representatives in the United States, Asia or Europe and the Middle East , or send an email inquiry to our support team.

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