| SpectraCD-XTR |
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Optical CD and Profile Metrology System
![]() Product Description
The SpectraCD-XTR optical CD/profile metrology system delivers improved precision accuracy, and tool-to-tool matching at the highest throughput and lowest cost-of-ownership (CoO) available. Evolved from the industry-leading, fourth-generation SpectraCD-XT system, the XTR uses patented spectroscopic ellipsometry (SE) technology to give chipmakers the ability to reliably predict performance and yield of complex devices in production and to identify potential yield and performance issues for next-generation products in development.
Application
Production CD line monitoring: Measures production wafers (post-lithography and -etch) to enable accurate CD control. SpectraCD-XTR provides much lower CoO than that of traditional CD-SEM metrology while giving information about profile shape that CD-SEM cannot.
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