Solutions

Equipment Solutions
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SensArray products are customized to fit the needs of nearly all semiconductor equipment. Each combination requires a very specific Process Probe wafer due to the varying temperatures, chemistries, and build of the chamber. By choosing the manufacturer of your equipment, you'll be able to find the SensArray solution that is right for you!

 

Applied Materials

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
DEPOSITION
Copper barrier seed Electra 65 to 400 SensArray 1530
Slab aluminum Endura 65 to 400 SensArray 1530
Aluminum seed ALPS 65 to 400 SensArray 1530
Tungsten liner barrier iLB TxZ 65 to 400 SensArray 1530
Ti TiN SIP TTN 65 to 400 SensArray 1530
Tungsten Sprint Centura; ALD W; Sprintplus 300 65 to 400 SensArray 1530
TiCl4 Ti and TiN Tectra Centura 65 to 600 SensArray 1530
Degas Electra, Endura, Centura 250 to 400 SensArray 1530
Preclean Electra, Endura, Centura PCII PCIIe 0 to 200 SensArray 1730; 2130; 2200 oxide coated wafer
       
PECVD Producer S, SE 400 to 800 SensArray 1530
HDP CVD Ultima Centura 400 to 800 SensArray 1530
CVD Low K Centura 300 to 400 SensArray 1530
LPCVD/SACVD Cold Wall Producer S, SE 300 to 500 SensArray 1530
LPCVD Hot Wall SiN Centura SiNgen 400 to 650 SensArray 1530
LPCVD Hot Wall Si Centura Polygen 400 to 650 SensArray 1530
High K Ta2O5 Centura: Giga cap TanOx 400 to 650 SensArray 1530
Gate stack Centura 300 to 650 SensArray 1530
ETCH
Metal Centura: DPS Plus 65 to 140;
400 for 2140		 2130,  2140,  2200
  Centura: DPS II 300 65 to 140;
400 for 2140		 2130,  2140,  2200
  Centura: ETCH II 65 to 140;
400 for 2140		 2130,  2140,  2200
Silicon Centuras: DPS Plus 65 to 140;
400 for 2140		 2130,  2140,  2200
  Centura: DPS300 65 to 140;
400 for 2140		 2130,  2140,  2200
  Centura: HART 65 to 140;
400 for 2140		 2130,  2140,  2200
  Centura: Etch II 65 to 140;
400 for 2140		 2130,  2140,  2200
Oxide Centura: eMax 65 to 140;
400 for 2140		 2130,  2140,  2200
  Centura: Super E 65 to 140;
400 for 2140		 2130,  2140,  2200
  Centura: Etch IPS 65 to 140;
400 for 2140		 2130,  2140,  2200
FLAT PANEL
  AKT-5500 200 to 400 2010
  AKT-10K; AKT-15 200 to 400 2010

 

 

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Applied Komatsu

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
FLAT PANEL
  AKT-5500 200 to 400 SensArray 2030,  SensArray 2050
  AKT-10K; AKT-15 200 to 400 SensArray 2030,  SensArray 2050

 

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Dainippon Screen

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
TRACK
Resist Processing SK-2000 100 to 140 SensArray 1840
  SK-3000 100 to 140 SensArray 1840
SPIN ON DIELECTRICS
Spin on Dielectrics SC-W60A-AVFG 200 to 400 SensArray 1530, 
SensArray 1850
  SC-W80A-AVFG 200 to 400 SensArray 1530, 
SensArray 1850
  SC-W80A-AVD 200 to 400 SensArray 1530,
SensArray 1850

 

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FSI

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
TRACK
Resist Processing Polaris 3500 (300 mm) 100 to 140 SensArray 1840
  Polaris 2500 (200 mm) 200 to 400 SensArray 1840
  Polaris 2100/2200 100 to 140 SensArray 1840
DEPOSITION
Spin-on Dielectric Calypso Low K 200 to 400 SensArray 1530,
SensArray 1850

 

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Lam Research

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
ETCH
Oxide Exelan 2300 65 to 125 2130,  2140, 2200
Metal Versys Metal TCP 65 to 125 2130,  2140, 2200
Silicon Versys Silicon TCP 65 to 125 2130,  2140, 2200

 

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Mattson

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
THERMAL
RTP 3000 RTP 400 to 1100 SensArray 1530
  2900 RTP 400 to 1100 SensArray 1530
  2800 RTP 400 to 1100 SensArray 1530
  2800cs RTP 400 to 1100 SensArray 1530
DEPOSITION
EPI EpiPro 800 to 1100 SensArray 1530
PECVD ASPEN II CVD 400 to 650 SensArray 1530
  ASPEN III CVD 400 to 650 SensArray 1530
ETCH
Plasma Resist Strip Aspen II strip 65 to 140;
400 for 2140		 2130; 2140; 2200
  Aspen III strip 65 to 140;
400 for 2140		 2130; 2140; 2200
ICP Isotropic Aspen II Lite etch 65 to 140;
400 for 2140		 2130; 2140; 2200
  Aspen III Lite etch 65 to 140;
400 for 2140		 2130; 2140; 2200

 

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Metron

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
RTP 610 RTP 400 to 1100 SensArray 1530
  4100 RTP 400 to 1100 SensArray 1530
  8108 RTP 400 to 1100 SensArray 1530
  8800 RTP 400 to 1100 SensArray 1530
Note: The equipment is formerly AG Associates, purchased by Metron.

 

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Novellus

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
DEPOSITION
 
Metal PVD INOVA 65 to 200 SensArray 1530
Al plug INOVA 300 to 400 SensArray 1530
CVD W Altus (Concepts 1 and 2) 300 to 400 SensArray 1530
MOCVD TiN PRISM 300 to 500 SensArray 1530
Cu Electrofill Sabre XT System 300 to 400 SensArray 1530,
1840 Rev A
PECVD Concept 1 Maximus Sequel 400 to 800 SensArray 1530
  Sequel (Concepts 2 & 3) 400 to 800 SensArray 1530
  Vector 400 to 800 SensArray 1530
HDP CVD SPEED (Concepts 2 & 3) 400 to 800 SensArray 1530

 

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Tegal

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
ETCH
Poly Etch 6510 65 to 140;
400 for 2140		 2130,  2140, 2200
Metal Etch 6520 65 to 140;
400 for 2140		 2130,  2140, 2200
Pt, PZT, SBT, BST, STO 6540 65 to 140;
400 for 2140		 2130,  2140, 2200
GMR Head Etch 6550 65 to 140;
400 for 2140		 2130,  2140, 2200
Plasma Etch 900 65 to 140;
400 for 2140		 2130,  2140, 2200
Plasma Strip   250 to 400 2130,  2140

 

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Tokyo Electron

PROCESS TOOL TEMP RANGE °C RECOMMENDATION
TRACK
Resist Processing ACT 8 100 to 140 SensArray 1840
  ACT 8 100 to 400 Accura°C 200
  Mark 8 100 to 140 SensArray 1840
  Mark 8 Vz 100 to 140 SensArray 1840
  ACT 12 100 to 140 SensArray 1840
  ACT 12 100 to 140 Accura°C 300
Spin on Dielectric ACT 8 SOD 300 to 400 SensArray 1530, 
SensArray 1850
  ACT 12 SOD 300 to 400 SensArray 1530, 
SensArray 1850
DIFFUSION
Diffusion LPCVD Alpha 8SE 500 to 700 SensArray 1530
  Alpha 303i 500 to 700 SensArray 1530
ETCH
  Unity 65 to 140 2130, 2140, 2200
  Telius 65 to 140 2130, 2140, 2200